Patents
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Kaloyeros, A.E. Arkles B. Methods and Systems for Producing Conformal Thin Films.
US Patent 12,398,469 B2 Issued August 26, 2025.
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Kaloyeros, A.E. Arkles B. Methods and Systems for Producing Conformal Thin Films. Pub. No.: Taiwan 113144915. Taiwan Patent Notice of Allowance Issued January 26, 2026.
Most Recent Scientific Publications
- Kaloyeros, A.E.; Arkles, B. Substrate Activated Conformal Deposition Through Interfacial Control by a Soft Energy Intensification Process for Functional Integration in High Performance Artificial Intelligence Computing. ACS Omega, 2025 10 (22), 23582-23590. View Publication
- Arkles, B.; Kaloyeros, A.E. A New Paradigm for Semiconductor Manufacturing: Integrated Synthesis, Delivery, and Consumption of Source Chemicals for IC Fabrication. Coatings 2024, 14(9), 1115-1130. View Publication
- Kaloyeros, A.E.; Arkles, B. Review-Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part II. PVD and Alternative (Non-PVD and Non-CVD) Deposition Techniques. ECS J. Solid State Sci. Technol. 2024, 13, 043001-043011. View Publication
- Kaloyeros, A.E.; Arkles, B. Review-Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part I Thermal and Plasma CVD. ECS J. Solid State Sci. Technol. 2023, 12, 103001-103022. View Publication
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